Source of two-dimensional electron gas in unintentionally doped AlGaN/GaN multichannel high-electron-mobility transistor heterostructures
نویسندگان
چکیده
Unintentionally doped (UID) AlGaN/GaN-based multichannel high electron mobility transistor (MC-HEMT) heterostructures have been demonstrated on the SiC substrate using plasma-assisted molecular beam epitaxy. The MC-HEMT heterostructure with a GaN channel thickness of 100 nm resulted in cumulative two-dimensional gas (2DEG) concentration 4.3 × 1013 cm−2 across six channels. sample showed sheet resistances 170 Ω/sq. and 101 at room temperature 90 K, respectively. source 2DEG buried channels was investigated. C–V measurements conducted UID MC-HEMTs excluded possibility valence band being consequent formation hole GaN-channel/AlGaN-barrier interfaces. A comparison experimentally obtained simulated data suggests presence donor-like trap states, situated 0.6 to 0.8 eV above interfaces, which act as heterostructures.
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ژورنال
عنوان ژورنال: Applied Physics Letters
سال: 2021
ISSN: ['1520-8842', '0003-6951', '1077-3118']
DOI: https://doi.org/10.1063/5.0045910